a study to develop a method of
Si film deposition onto low-cost substrates,
thin layers of silicon were
electrodeposited onto crystalline-Si, MG-Si, and silver substrates.
Thin layers of thicknesses
in the range10-60 μm
have been grown. Growth rates of up to 0.75 μm/min have been demonstrated. Growth is epitaxial on silicon
substrates. For more details, see the reference below.
J.T. Moore, T.H. Wang, M.J. Heben, K. Douglas, and T.F.
Ciszek, "Fused-Salt Electrodeposition of Thin-Layer Silicon," in:
Photovoltaic Specialist Conf. Record, Anaheim, CA, Sept. 29-Oct. 3, 1997 (IEEE, New
Jersey, 1997) pp. 775-778.
Epitaxial thin Si layer
elecrodeposited on a multicrystalline Si substrate