a study to develop a method of
Si film deposition onto low-cost substrates,
thin layers of silicon were
electrodeposited onto crystalline-Si, MG-Si, and silver substrates.
Thin layers of thicknesses
in the range10-60 mm
have been grown. Growth rates of up to 0.75 mm
per min have been demonstrated. Growth is epitaxial on silicon
substrates. For more details, see the reference below.
J.T. Moore, T.H. Wang, M.J. Heben, K. Douglas, and T.F.
Ciszek, "Fused-Salt Electrodeposition of Thin-Layer Silicon," in:
Photovoltaic Specialist Conf. Record, Anaheim, CA, Sept. 29-Oct. 3, 1997 (IEEE, New
Jersey, 1997) pp. 775-778.
Epitaxial thin Si layer
elecrodeposited on a multicrystalline Si substrate