In a study to develop a method of Si film deposition onto low-cost substrates, thin layers of silicon were electrodeposited onto crystalline-Si, MG-Si, and silver substrates. Thin layers of thicknesses in the range10-60 μm have been grown. Growth rates of up to 0.75 μm/min have been demonstrated.  Growth is epitaxial on silicon substrates.  For more details, see the reference below.

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J.T. Moore, T.H. Wang, M.J. Heben, K. Douglas, and T.F. Ciszek, "Fused-Salt Electrodeposition of Thin-Layer Silicon," in: 26th IEEE Photovoltaic Specialist Conf. Record, Anaheim, CA, Sept. 29-Oct. 3, 1997 (IEEE, New Jersey, 1997) pp. 775-778.

Epitaxial thin Si layer elecrodeposited on a multicrystalline Si substrate